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Resist-free antireflective nanostructured film fabricated by thermal-NIL
Resist-free antireflective (AR) nanostructured films are directly fabricated on polycarbonate (PC) film using thermal-nanoimprint lithography (T-NIL) and the moth-eye shape of AR nanostructure is elaborately optimized with different oxygen reactive ion etching conditions. Anodic aluminum oxide (AAO)...
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| Publicat a: | Nano Converg |
|---|---|
| Autors principals: | , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Korea Nano Technology Research Society
2014
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5271020/ https://ncbi.nlm.nih.gov/pubmed/28191399 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s40580-014-0019-1 |
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