Á lódáil...
A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface
Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O(2) re...
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| Main Authors: | , , , , , |
|---|---|
| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe: |
Springer
2012
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| Ábhair: | |
| Rochtain Ar Líne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3552822/ https://ncbi.nlm.nih.gov/pubmed/22853428 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-430 |
| Clibeanna: |
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