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Morphological and nanostructural features of porous silicon prepared by electrochemical etching

Porous layers were produced on a p-type (100) Si wafer by electrochemical anodic etching. The morphological, nanostructural and optical features of the porous Si were investigated as functions of the etching conditions. As the wafer resistivity was increased from 0.005 to 15 Ω·cm, the etched region...

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Detalhes bibliográficos
Main Authors: Kim, Hyohan, Cho, Namhee
Formato: Artigo
Idioma:Inglês
Publicado em: Springer 2012
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3432630/
https://ncbi.nlm.nih.gov/pubmed/22818179
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-408
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