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Copper-selective electrochemical filling of macropore arrays for through-silicon via applications

In this article, the physico-chemical and electrochemical conditions of through-silicon via formation were studied. First, macropore arrays were etched through a low doped n-type silicon wafer by anodization under illumination into a hydrofluoric acid-based electrolyte. After electrochemical etching...

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Detalhes bibliográficos
Main Authors: Defforge, Thomas, Billoué, Jérôme, Diatta, Marianne, Tran-Van, François, Gautier, Gaël
Formato: Artigo
Idioma:Inglês
Publicado em: Springer 2012
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3414756/
https://ncbi.nlm.nih.gov/pubmed/22776559
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-375
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