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Removal of 10-nm contaminant particles from Si wafers using CO(2 )bullet particles
Removal of nanometer-sized contaminant particles (CPs) from substrates is essential in successful fabrication of nanoscale devices. The particle beam technique that uses nanometer-sized bullet particles (BPs) moving at supersonic velocity was improved by operating it at room temperature to achieve h...
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| Main Authors: | , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3349508/ https://ncbi.nlm.nih.gov/pubmed/22494621 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-211 |
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