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Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates

The optical properties of plasmonic semiconductor devices fabricated by focused ion beam (FIB) milling deteriorate because of the amorphisation of the semiconductor substrate. This study explores the effects of combining traditional 30 kV FIB milling with 5 kV FIB patterning to minimise the semicond...

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Detalhes bibliográficos
Main Authors: Einsle, Joshua F, Bouillard, Jean-Sebastien, Dickson, Wayne, Zayats, Anatoly V
Formato: Artigo
Idioma:Inglês
Publicado em: Springer 2011
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3234295/
https://ncbi.nlm.nih.gov/pubmed/22040004
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-572
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