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Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates

The optical properties of plasmonic semiconductor devices fabricated by focused ion beam (FIB) milling deteriorate because of the amorphisation of the semiconductor substrate. This study explores the effects of combining traditional 30 kV FIB milling with 5 kV FIB patterning to minimise the semicond...

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Autors principals: Einsle, Joshua F, Bouillard, Jean-Sebastien, Dickson, Wayne, Zayats, Anatoly V
Format: Artigo
Idioma:Inglês
Publicat: Springer 2011
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC3234295/
https://ncbi.nlm.nih.gov/pubmed/22040004
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-572
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