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Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si
Ion beam sputtering of ultrathin film Au coatings used as a physical catalyst for self-organization of Si nanostructures has been achieved by tuning the incident particle energy. This approach holds promise as a scalable nanomanufacturing parallel processing alternative to candidate nanolithography...
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| Hauptverfasser: | , , , |
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer
2011
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3211498/ https://ncbi.nlm.nih.gov/pubmed/21711934 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-403 |
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