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Sputtering of silicon nanopowders by an argon cluster ion beam
In this work an Ar(+) cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 10(14)–2.3 × 10(16) cluster/cm(2) was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam par...
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| Veröffentlicht in: | Beilstein J Nanotechnol |
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| Hauptverfasser: | , , , , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Beilstein-Institut
2019
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6334788/ https://ncbi.nlm.nih.gov/pubmed/30680286 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.10.13 |
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