Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
Two-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Grow...
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| Principais autores: | , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Yukhnovskii Institute for Condensed Matter Physics of the National Academy of Sciences of Ukraine
2011-06-01
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| coleção: | Condensed Matter Physics |
| Assuntos: | |
| Acesso em linha: | http://dx.doi.org/10.5488/CMP.14.23602 |
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