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Freestanding HfO(2 )grating fabricated by fast atom beam etching

We report here the fabrication of freestanding HfO(2 )grating by combining fast atom beam etching (FAB) of HfO(2 )film with dry etching of silicon substrate. HfO(2 )film is deposited onto silicon substrate by electron beam evaporator. The grating patterns are then defined by electron beam lithograph...

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Bibliografske podrobnosti
Main Authors: Wang, Yongjin, Wu, Tong, Kanamori, Yoshiaki, Hane, Kazuhiro
Format: Artigo
Jezik:Inglês
Izdano: Springer 2011
Teme:
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC3211457/
https://ncbi.nlm.nih.gov/pubmed/21711898
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-367
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