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Freestanding HfO(2 )grating fabricated by fast atom beam etching

We report here the fabrication of freestanding HfO(2 )grating by combining fast atom beam etching (FAB) of HfO(2 )film with dry etching of silicon substrate. HfO(2 )film is deposited onto silicon substrate by electron beam evaporator. The grating patterns are then defined by electron beam lithograph...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Prif Awduron: Wang, Yongjin, Wu, Tong, Kanamori, Yoshiaki, Hane, Kazuhiro
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: Springer 2011
Pynciau:
Mynediad Ar-lein:https://ncbi.nlm.nih.gov/pmc/articles/PMC3211457/
https://ncbi.nlm.nih.gov/pubmed/21711898
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-367
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