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E-beam lithography for micro-∕nanofabrication
Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give...
Gorde:
| Egile nagusia: | |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
American Institute of Physics
2010
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| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2917861/ https://ncbi.nlm.nih.gov/pubmed/20697574 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.3437589 |
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