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E-beam lithography for micro-∕nanofabrication
Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give...
Na minha lista:
| Príomhúdar: | |
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| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe: |
American Institute of Physics
2010
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| Ábhair: | |
| Rochtain Ar Líne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2917861/ https://ncbi.nlm.nih.gov/pubmed/20697574 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.3437589 |
| Clibeanna: |
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