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A Wafer-Scale Etching Technique for High Aspect Ratio Implantable MEMS Structures
Microsystem technology is well suited to batch fabricate microelectrode arrays, such as the Utah electrode array (UEA), intended for recording and stimulating neural tissue. Fabrication of the UEA is primarily based on the use of dicing and wet etching to achieve high aspect ratio (15:1) penetrating...
שמור ב:
| Main Authors: | , , , |
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| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
2010
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| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2917827/ https://ncbi.nlm.nih.gov/pubmed/20706618 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1016/j.sna.2010.06.011 |
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