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Vertically integrated, three-dimensional nanowire complementary metal-oxide-semiconductor circuits

Three-dimensional (3D), multi-transistor-layer, integrated circuits represent an important technological pursuit promising advantages in integration density, operation speed, and power consumption compared with 2D circuits. We report fully functional, 3D integrated complementary metal-oxide-semicond...

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Detalhes bibliográficos
Main Authors: Nam, SungWoo, Jiang, Xiaocheng, Xiong, Qihua, Ham, Donhee, Lieber, Charles M.
Formato: Artigo
Idioma:Inglês
Publicado em: National Academy of Sciences 2009
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC2783010/
https://ncbi.nlm.nih.gov/pubmed/19940239
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1073/pnas.0911713106
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