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The Influence of Microstructure on Nanomechanical and Diffusion Barrier Properties of Thin PECVD SiOx Films Deposited on Parylene C Substrates
Plasma-enhanced chemical vapor deposition (PECVD) was used to deposit SiOx thin films of varying thicknesses on parylene C substrates, using hexamethyldisiloxane (HMDSO) as a precursor. The microstructure of SiOx coatings was analyzed using X-ray photoemission spectroscopy (XPS), nanoindentation, an...
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| 主要な著者: | , , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Frontiers Media S.A.
2019-12-01
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| シリーズ: | Frontiers in Materials |
| 主題: | |
| オンライン･アクセス: | https://www.frontiersin.org/article/10.3389/fmats.2019.00319/full |
| タグ: |
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