Pulsed DC Sputter Deposition of Stable Turbostratic Boron Nitride Thin Films
ABSTRACT Boron nitride (BN) is considered for several applications in microelectronics, such as thermal management, optoelectronics, or as memristors. BN can be deposited with different deposition methods, but any integration in the back‐end‐of‐the‐line limits the deposition temperature to approxima...
I tiakina i:
| Ngā kaituhi matua: | , , , , , , , , , |
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| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
Wiley-VCH
2026-04-01
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| Rangatū: | Advanced Materials Interfaces |
| Ngā marau: | |
| Urunga tuihono: | https://doi.org/10.1002/admi.202501038 |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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