Improvement of Laser Damage Resistance of Fused Silica Using Oxygen-Aided Reactive Ion Etching
Reactive ion etching (RIE) with fluorocarbon plasma is a facile method to tracelessly remove the subsurface damage layer of fused silica but has the drawback of unsatisfactory improvement in laser damage resistance due to the induction of secondary defects. This work proposes to incorporate O<sub>2<...
Salvato in:
| Autori principali: | , , , , , , |
|---|---|
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
MDPI AG
2024-08-01
|
| Serie: | Photonics |
| Soggetti: | |
| Accesso online: | https://www.mdpi.com/2304-6732/11/8/726 |
| Tags: |
Nessun Tag, puoi essere il primo ad aggiungerne!!
|