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Evolution of Fused Silica Subsurface Damage in Chemical Etching and Its Influence on Surface Loss

Mitigating the surface loss induced by subsurface damage is of critical importance in the manufacturing of fused silica devices with ultra-low mechanical loss. Chemical etching technology has been applied as an effective approach in controlling surface loss, while fundamental research on its mechani...

Ausführliche Beschreibung

Gespeichert in:
Hauptverfasser: Xiaoqiang Zhang, Chengkui Zu, Lidong Wang, Xuefu Song, Yuancheng Sun, Xiurong Du, Yongchang Zhu
Format: Artigo
Sprache:Inglês
Veröffentlicht: MDPI AG 2026-04-01
Schriftenreihe:Sensors
Schlagworte:
fused silica resonator
subsurface damage
chemical etching
mechanical quality factor
surface loss
Online-Zugang:https://www.mdpi.com/1424-8220/26/8/2449
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