A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

A two-step physical-chemical etching method, namely large incident angle ion beam etching followed by HF etching, is proposed to remove the damage precursors in fused silica surface to achieve good surface quality and significantly improve the laser damage resistance of fused silica. Ion beam etchin...

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Bibliografiska uppgifter

Huvudupphov:	Bo Li, Wenfeng Sun, Xia Xiang, Xiaolong Jiang, Wei Liao, Haijun Wang, Xiaodong Yuan, Xiaodong Jiang, Xiaotao Zu
Materialtyp:	Artigo
Språk:	Inglês
Utgiven:	Elsevier 2022-07-01
Serie:	Journal of Materials Research and Technology
Ämnen:	Fused silica Two-step etching Surface quality Laser damage threshold
Länkar:	http://www.sciencedirect.com/science/article/pii/S223878542200922X
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