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Atomic‐Scale Epitaxy for Tailoring Crystalline GeSbTe Alloys Into Bidimensional Phases

ABSTRACT In this study, we establish an accurate growth diagram—describing the phase, composition, and atomic stacking of Ge‐Sb‐Te alloys (GST)—that can be used as a prediction tool for thin film deposition. This framework for epitaxy at the atomic scale allows for designing tailored crystalline GST...

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I tiakina i:
Ngā taipitopito rārangi puna kōrero
Ngā kaituhi matua: Valeria Bragaglia, Fabrizio Arciprete, Simone Prili, Yukihiko Takagaki, Antonio Massimiliano Mio, Riccardo Mazzarello, Jos Emiel Boschker, Raffaella Calarco
Hōputu: Artigo
Reo:Inglês
I whakaputaina: Wiley-VCH 2026-01-01
Rangatū:Advanced Materials Interfaces
Ngā marau:
Urunga tuihono:https://doi.org/10.1002/admi.202500937
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