A Two-Stage Unet Framework for Sub-Resolution Assist Feature Prediction
Sub-resolution assist feature (SRAF) is a widely used resolution enhancement technology for improving image contrast and the common process window in advanced lithography processes. However, both model-based SRAF and rule-based SRAF methods suffer from challenges of adaptability or high computationa...
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| Główni autorzy: | , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
MDPI AG
2025-11-01
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| Seria: | Micromachines |
| Hasła przedmiotowe: | |
| Dostęp online: | https://www.mdpi.com/2072-666X/16/11/1301 |
| Etykiety: |
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