Balanced truncation model reduction for laser heating wafer model in frequency restricted domain
Modeling and simulating laser heating phenomena are crucial for optimizing manufacturing processes and ensuring high-quality final products. A major challenge in semiconductor manufacturing is achieving accurate, real-time temperature control during wafer heating. To reduce the computational burden...
Furkejuvvon:
| Váldodahkkit: | , , , , |
|---|---|
| Materiálatiipa: | Artigo |
| Giella: | Inglês |
| Almmustuhtton: |
Elsevier
2024-12-01
|
| Ráidu: | Franklin Open |
| Fáttát: | |
| Liŋkkat: | http://www.sciencedirect.com/science/article/pii/S277318632400121X |
| Fáddágilkorat: |
Eai fáddágilkorat, Lasit vuosttaš fáddágilkora!
|