Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities
Silicon nanofabrication plays a crucial role in the development of advanced electronic, photonic, and quantum devices. Focused ion beam (FIB) milling is widely used for direct patterning at the nanoscale, but it requires high ion fluences, leading to long processing times, material redeposition, and...
Tallennettuna:
| Päätekijät: | , , , , , , , , , |
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| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Elsevier
2025-09-01
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| Sarja: | Micro and Nano Engineering |
| Aiheet: | |
| Linkit: | http://www.sciencedirect.com/science/article/pii/S2590007225000140 |
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