Helium focused ion beam direct milling of plasmonic heptamer-arranged nanohole arrays
We fabricate plasmonic heptamer-arranged nanohole (HNH) arrays by helium (He) focused ion beam (HeFIB) milling, which is a resist-free, maskless, direct-write method. The small He+ beam spot size and high milling resolution achieved by the gas field-ionization source used in our HeFIB allows the mil...
में बचाया:
| मुख्य लेखकों: | , , |
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| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
Wiley
2020-02-01
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| श्रृंखला: | Nanophotonics |
| विषय: | |
| ऑनलाइन पहुंच: | https://doi.org/10.1515/nanoph-2019-0385 |
| टैग: |
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