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Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities

Silicon nanofabrication plays a crucial role in the development of advanced electronic, photonic, and quantum devices. Focused ion beam (FIB) milling is widely used for direct patterning at the nanoscale, but it requires high ion fluences, leading to long processing times, material redeposition, and...

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Bibliografische gegevens
Hoofdauteurs: E. Scattolo, A. Cian, J. Llobet, X. Borrise Nogue, S. Mondal, M. Barozzi, A. Bagolini, M. Crivellari, F. Pérez-Murano, D. Giubertoni
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: Elsevier 2025-09-01
Reeks:Micro and Nano Engineering
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Online toegang:http://www.sciencedirect.com/science/article/pii/S2590007225000140
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