Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices
Abstract We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.
-д хадгалсан:
| Үндсэн зохиолчид: | , , |
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| Формат: | Artigo |
| Хэл сонгох: | Inglês |
| Хэвлэсэн: |
Nature Portfolio
2025-09-01
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| Цуврал: | Scientific Reports |
| Нөхцлүүд: | |
| Онлайн хандалт: | https://doi.org/10.1038/s41598-025-19744-7 |
| Шошгууд: |
Шошго байхгүй, Энэхүү баримтыг шошголох эхний хүн болох!
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