Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices
Abstract We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.
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| Autori principali: | , , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Nature Portfolio
2025-09-01
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| Serie: | Scientific Reports |
| Soggetti: | |
| Accesso online: | https://doi.org/10.1038/s41598-025-19744-7 |
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