Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices
Abstract We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.
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| Autores principales: | , , |
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| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Nature Portfolio
2025-09-01
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| Colección: | Scientific Reports |
| Materias: | |
| Acceso en línea: | https://doi.org/10.1038/s41598-025-19744-7 |
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