Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography
A pellicle is a thin membrane structure that protects an extreme ultraviolet (EUV) mask from contamination during the exposure process. However, its limited transmittance induces unwanted heating owing to the absorption of EUV photons. The rupture of the EUV pellicle can be avoided by improving its...
Sábháilte in:
| Príomhchruthaitheoirí: | , , , , |
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| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe / Cruthaithe: |
MDPI AG
2022-03-01
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| Sraith: | Membranes |
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| Rochtain ar líne: | https://www.mdpi.com/2077-0375/12/4/367 |
| Clibeanna: |
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
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