Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using an EUV ptychography microscope, we analyzed how mask imaging performance is affected by locally obstructed mask diffraction c...
Gorde:
| Egile Nagusiak: | , , , , , , |
|---|---|
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
MDPI AG
2025-03-01
|
| Saila: | Photonics |
| Gaiak: | |
| Sarrera elektronikoa: | https://www.mdpi.com/2304-6732/12/3/266 |
| Etiketak: |
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
|