Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using an EUV ptychography microscope, we analyzed how mask imaging performance is affected by locally obstructed mask diffraction c...
I tiakina i:
| Ngā kaituhi matua: | , , , , , , |
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| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
MDPI AG
2025-03-01
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| Rangatū: | Photonics |
| Ngā marau: | |
| Urunga tuihono: | https://www.mdpi.com/2304-6732/12/3/266 |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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