Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography
Model-based optical proximity correction (OPC) is a widely adopted resolution enhancement technique that compensates for lithography proximity effects by adjusting and correcting mask pattern shapes. However, its application to large-area, high-density patterns such as metasurfaces is constrained by...
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| Автори: | , , , , , , , , , , |
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| Формат: | Artigo |
| Мова: | Inglês |
| Опубліковано: |
IEEE
2025-01-01
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| Серія: | IEEE Access |
| Предмети: | |
| Онлайн доступ: | https://ieeexplore.ieee.org/document/11241980/ |
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