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Nanosheet integration of induced tunnel field-effect transistor with lower cost and lower power

Abstract Nanosheet transistors are poised to become the preferred choice for the next generation of smaller-sized devices in the future. To address the future demand for high-performance and low-power computing applications, this study proposes a nanosheet structure with a vertically stacked design,...

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Bibliografske podrobnosti
Principais autores: Jyi-Tsong Lin, Chia-Yo Kuo
Format: Artigo
Jezik:Inglês
Izdano: Springer 2024-07-01
Serija:Discover Nano
Teme:
Online dostop:https://doi.org/10.1186/s11671-024-04036-2
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