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Improvement of Resistance Change Memory Characteristics in Ferroelectric and Antiferroelectric (like) Parallel Structures

Recently, considerable attention has been paid to the development of advanced technologies such as artificial intelligence (AI) and big data, and high-density, high-speed storage devices are being extensively studied to realize the technology. Ferroelectrics are promising non-volatile memory materia...

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Autori principali: Wonwoo Kho, Hyunjoo Hwang, Jisoo Kim, Gyuil Park, Seung-Eon Ahn
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI AG 2023-01-01
Serie:Nanomaterials
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Accesso online:https://www.mdpi.com/2079-4991/13/3/439
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