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Investigation of Negative Bias Temperature Instability Effect in Nano PDSOI PMOSFET

The Negative Bias Temperature Instability (NBTI) effect of partially depleted silicon-on-insulator (PDSOI) PMOSFET based on 130 nm is investigated. First, the effect of NBTI on the IV characteristics and parameter degradation of T-Gate PDSOI PMOSFET was investigated by accelerated stress tests. The...

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Autors principals: Yafang Yang, Hongxia Liu, Kun Yang, Zihou Gao, Zixu Liu
Format: Artigo
Idioma:Inglês
Publicat: MDPI AG 2022-05-01
Col·lecció:Micromachines
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Accés en línia:https://www.mdpi.com/2072-666X/13/5/808
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