High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO₂films: the effect of repetition frequency

<p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO₂thin films using dc dual magnetron (DM) sputtering in Ar + O₂mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with...

ver descrição completa

Detalhes bibliográficos

Principais autores:	Strýhal Z, Pavlík J, Šícha J, Heřman D, Musil J
Formato:	Artigo
Idioma:	Inglês
Publicado em:	SpringerOpen 2007-01-01
Colecção:	Nanoscale Research Letters
Assuntos:	TiO<sub>2</sub>film Hydrophilicity Deposition rate Unheated substrate Dual magnetron sputtering Polycarbonate
Acesso em linha:	http://dx.doi.org/10.1007/s11671-007-9042-z
Tags:	Adicionar Tag Sem tags, seja o primeiro a adicionar uma tag!