High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency
<p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with...
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| Autors principals: | , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
SpringerOpen
2007-01-01
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| Col·lecció: | Nanoscale Research Letters |
| Matèries: | |
| Accés en línia: | http://dx.doi.org/10.1007/s11671-007-9042-z |
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