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Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2nm. The waveguides were patterned along the [112] direction on a [110] SOI substrate. The waveguide boundaries are...

Deskribapen osoa

Gorde:
Egile Nagusiak: Kapil eDebnath, Hideo eArimoto, Muhammad K. Husain, Alyssa ePrasmusinto, Abdelrahman eAl-Attili, Rafidah ePetra, Harold M H Chong, Graham Trevor Reed, Shinichi eSaito
Formatua: Artigo
Hizkuntza:Inglês
Argitaratua: Frontiers Media S.A. 2016-02-01
Saila:Frontiers in Materials
Gaiak:
silicon photonics
integrated photonics
Waveguide
Grating coupler
Anisotropic wet etching
Sarrera elektronikoa:http://journal.frontiersin.org/Journal/10.3389/fmats.2016.00010/full
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