Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2nm. The waveguides were patterned along the [112] direction on a [110] SOI substrate. The waveguide boundaries are...

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Autors principals:	Kapil eDebnath, Hideo eArimoto, Muhammad K. Husain, Alyssa ePrasmusinto, Abdelrahman eAl-Attili, Rafidah ePetra, Harold M H Chong, Graham Trevor Reed, Shinichi eSaito
Format:	Artigo
Idioma:	Inglês
Publicat:	Frontiers Media S.A. 2016-02-01
Col·lecció:	Frontiers in Materials
Matèries:	silicon photonics integrated photonics Waveguide Grating coupler Anisotropic wet etching
Accés en línia:	http://journal.frontiersin.org/Journal/10.3389/fmats.2016.00010/full
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