Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2nm. The waveguides were patterned along the [112] direction on a [110] SOI substrate. The waveguide boundaries are...

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Bibliografiske detaljer

Principais autores:	Kapil eDebnath, Hideo eArimoto, Muhammad K. Husain, Alyssa ePrasmusinto, Abdelrahman eAl-Attili, Rafidah ePetra, Harold M H Chong, Graham Trevor Reed, Shinichi eSaito
Format:	Artigo
Sprog:	Inglês
Udgivet:	Frontiers Media S.A. 2016-02-01
Serier:	Frontiers in Materials
Fag:	silicon photonics integrated photonics Waveguide Grating coupler Anisotropic wet etching
Online adgang:	http://journal.frontiersin.org/Journal/10.3389/fmats.2016.00010/full
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