Deformation mechanism of metastable oriented grains in high-purity tantalum under different strain paths
High-purity tantalum is used as the sputtering target material for integrated circuits, requiring fine grains and random texture. Understanding different orientation deformation mechanisms, especially the metastable orientation (here {112} crystallographic orientations), is beneficial for controllin...
Na minha lista:
| Principais autores: | , , , , |
|---|---|
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Elsevier
2024-05-01
|
| Serier: | Journal of Materials Research and Technology |
| Fag: | |
| Online adgang: | http://www.sciencedirect.com/science/article/pii/S2238785424010299 |
| Tags: |
Ingen Tags, Vær først til at tagge denne postø!
|