Deformation mechanism of metastable oriented grains in high-purity tantalum under different strain paths
High-purity tantalum is used as the sputtering target material for integrated circuits, requiring fine grains and random texture. Understanding different orientation deformation mechanisms, especially the metastable orientation (here {112} crystallographic orientations), is beneficial for controllin...
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| Asıl Yazarlar: | , , , , |
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| Materyal Türü: | Artigo |
| Dil: | Inglês |
| Baskı/Yayın Bilgisi: |
Elsevier
2024-05-01
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| Seri Bilgileri: | Journal of Materials Research and Technology |
| Konular: | |
| Online Erişim: | http://www.sciencedirect.com/science/article/pii/S2238785424010299 |
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