Código QR

Modeling of low-temperature plasma inhibition and mechanism of Aspergillus flavus on corn kernels surface

This study was conducted to optimize a process of low-temperature plasma treatment for the decontamination of Aspergillus flavus (A. flavus) on corn kernels. Impacts of plasma-treated time (30, 60, 90 s), plasma-treated power (300, 400, 500 W), and vacuum degree (85, 90, 95 Pa) on the decontaminatio...

Descrición completa

Gardado en:
Detalles Bibliográficos
Principais autores: Shuai Li, Haiyang Zou, Mo Niu, Yingnan Zeng, Jingxin Song
Formato: Artigo
Idioma:Inglês
Publicado: Taylor & Francis Group 2024-12-01
Series:CyTA - Journal of Food
Assuntos:
Acceso en liña:https://www.tandfonline.com/doi/10.1080/19476337.2024.2338276
Tags: Engadir etiqueta
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!