Real-time generation of circular patterns in electron beam lithography
Electron beam lithography (EBL) involves the transfer of a pattern onto the surface of a substrate by first scanning a thin layer of organic film (called resist) on the surface by a tightly focused and precisely controlled electron beam (exposure) and then selectively removing the exposed or nonexpo...
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| Principais autores: | , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
AIP Publishing LLC
2024-09-01
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| coleção: | Nanotechnology and Precision Engineering |
| Acesso em linha: | http://dx.doi.org/10.1063/10.0025757 |
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