Electron beam lithography on nonplanar and irregular surfaces
Abstract E-beam lithography is a powerful tool for generating nanostructures and fabricating nanodevices with fine features approaching a few nanometers in size. However, alternative approaches to conventional spin coating and development processes are required to optimize the lithography procedure...
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| Main Authors: | , , , , |
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| Format: | Artigo |
| Language: | Inglês |
| Published: |
Nature Publishing Group
2024-04-01
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| Series: | Microsystems & Nanoengineering |
| Subjects: | |
| Online Access: | https://doi.org/10.1038/s41378-024-00682-9 |
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