Electron beam lithography on nonplanar and irregular surfaces
Abstract E-beam lithography is a powerful tool for generating nanostructures and fabricating nanodevices with fine features approaching a few nanometers in size. However, alternative approaches to conventional spin coating and development processes are required to optimize the lithography procedure...
Tallennettuna:
| Päätekijät: | , , , , |
|---|---|
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Nature Publishing Group
2024-04-01
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| Sarja: | Microsystems & Nanoengineering |
| Aiheet: | |
| Linkit: | https://doi.org/10.1038/s41378-024-00682-9 |
| Tagit: |
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