Substrate Effect in Electron Beam Lithography
Electron Beam Lithography (EBL) process strongly depends on the type of the applied lithographic system, composed of electron sensitive polymers and the substrate. Moreover, applied acceleration voltage changes the volume of Backscattered Electrons (BSE) participation in total energy absorption in r...
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| 主要な著者: | , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
VSB-Technical University of Ostrava
2018-01-01
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| シリーズ: | Advances in Electrical and Electronic Engineering |
| 主題: | |
| オンライン･アクセス: | http://advances.utc.sk/index.php/AEEE/article/view/2746 |
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