Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patte...

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Hlavní autoři:	Saumya Satyarthy, Md Hasan Ul Iqbal, Fairoz Abida, Ridwan Nahar, Adam J. Hauser, Mark Ming-Cheng Cheng, Ayanjeet Ghosh
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	MDPI AG 2023-10-01
Edice:	Nanomaterials
Témata:	atomic layer deposition carboxylic acid self-assembled monolayers inhibitor atomic-force microscopy infrared spectroscopy
On-line přístup:	https://www.mdpi.com/2079-4991/13/19/2713
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