Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patte...

Description complète

Détails bibliographiques

Auteurs principaux:	Saumya Satyarthy, Md Hasan Ul Iqbal, Fairoz Abida, Ridwan Nahar, Adam J. Hauser, Mark Ming-Cheng Cheng, Ayanjeet Ghosh
Format:	Artigo
Langue:	Inglês
Publié:	MDPI AG 2023-10-01
Collection:	Nanomaterials
Sujets:	atomic layer deposition carboxylic acid self-assembled monolayers inhibitor atomic-force microscopy infrared spectroscopy
Accès en ligne:	https://www.mdpi.com/2079-4991/13/19/2713
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!